发明名称 PHOTOMASK
摘要 PURPOSE:To transfer different patterns with a sheet of photomask by functioning the photomask in such a manner that at least a part thereof allows the selective transmission of a polarizing component in a specific direction. CONSTITUTION:A metallic film is formed on a photomask substrate 11 and only the parts of the patterns 12, 13 are made transparent to light without being formed with the metallic film. The pattern 13 is coated with a dichromatic high-polymer film 14. The angle between the direction of the polarized light selectively transmitted by the film 14 and the polarization angle of the linearly polarized light to be used as exposing light is designed as theta. Then, the film 14 allows the transmission of the light and the pattern 13 is transferred in the case of theta=0 deg.. The film 14 absorbs the light and the pattern 14 is not transferred in the case of theta=90 deg.. Since the dichromatic high-polymer film which allows the selective transmission of the polarization component in the specific direction is provided in such a manner, the different patterns are transferred with a sheet of the photomask and the number of the photomask is decreased.
申请公布号 JPS63303357(A) 申请公布日期 1988.12.09
申请号 JP19870140221 申请日期 1987.06.03
申请人 NEC CORP 发明人 OOISHI ATSUYA
分类号 G03F1/00;G03F1/54;H01L21/027;H01L21/30 主分类号 G03F1/00
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