发明名称 THIN FILM FORMING COMPOSITION
摘要 PURPOSE:To obtain the title thin film forming composition capable of forming a uniform, transparent, and electrically conductive thin film having excellent conductivity and keeping excellent shelf stability over a long period by incorpo rating specified indium compd., peroxide, and solvent into the composition. CONSTITUTION:The thin film forming composition contains an indium compd. shown by the general formula InX3 [where X is an alkoxy group, acyloxy group, or org. group shown by -OC(R)=CHOR', R is an alkyl group, and R' shown an alkyl or alkoxy group], peroxide, and solvent and, can be preserved for a long period. Indium trimethoxide, etc., are used as the indium compd. For example, about 0.5-4mol. hydrogen peroxide, per one mol. indium compd., is preferably used as the peroxide. Ketones and alcohols are preferably used as the solvent, and the solid concn. in the composition is appropriately controlled to about 1-25wt.%. The composition is coated on a metal, etc., and heated at about 400-600 deg.C to obtain a transparent conductive than film consisting essentially of In2O3.
申请公布号 JPS63310970(A) 申请公布日期 1988.12.19
申请号 JP19870146392 申请日期 1987.06.12
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 YAMADA KINJI;OKAMURA MOMOKO;NAGATA MASAKI
分类号 C01G15/00;C03C17/25;C04B41/87;C23C18/12 主分类号 C01G15/00
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