发明名称 TREATMENT EQUIPMENT OF WASTE GAS FOR DRY ETCHING DEVICE
摘要 <p>PURPOSE:To facilitate detection of reactive gas which is not adsorbed to an adsorbent of a waste gas treatment cylinder and is discharged by providing both a reaction tank in which the waste gas sent from the waste gas treatment cylinder is allowed to react with water and a smoke sensor for detecting white smoke. CONSTITUTION:A treatment equipment of waste gas which consists of a waste gas treatment cylinder 7, a reaction tank 9 and a smoke sensor 12 is connected with a rotary pump 6 of a dry etching device used for production of a semiconductor device. The waste gas sent from the dry etching device is introduced into the treatment cylinder 7 and reactive gas or the like is adsorbed and removed with an adsorbent 18 packed to the inside of the treatment cylinder 7 and thereafter discarded to an exhaust duct. The reactive gas is sucked with a suction pump 10 through a gas suction pipe 13 buried in the upper part of the treatment cylinder 7 and bubbled in reaction liquid 14 of the reaction tank 9. Since the reactive gas such as BCl3 is allowed to react with water and white smoke is generated, a smoke sensor 12 is actuated in case white smoke is generated and a patrol lamp 8 is turned on a light and the break-through of the adsorbent 18 is automatically detected.</p>
申请公布号 JPS644219(A) 申请公布日期 1989.01.09
申请号 JP19870160616 申请日期 1987.06.26
申请人 NEC CORP 发明人 ITO HIDEO
分类号 H01L21/302;B01D53/30;B01D53/34;B01D53/46;B01D53/68;B01D53/77 主分类号 H01L21/302
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