| 摘要 |
PURPOSE:To easily form a diamond-like carbon film on a substrate into fine pattern by removing a formed resist and diamond-like carbon film on the resist by a lift off method. CONSTITUTION:A lower electrode pattern 2 is formed on a substrate 1 and also a resist pattern 3 is formed onto the part requiring no hard carbon film, on which a hard carbon film 4 is formed by a plasma CVD method, etc. Subsequently, the resist 3 is peeled off by using a resist-peeling solution, etc., by which the hard carbon film 4 on the resist is removed and the hard carbon film is patterned only in the required part. Accordingly, the fine working of the hard carbon film is made possible and the application to electronic devices can be attained. |
