发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To improve the solubility and the light permeability of the title composition by incorporating a polyimide precursor having specified repeating unit, photopolymerization initiator, polymerizable unsatd. compd. and an org. solvent in said composition. CONSTITUTION:The photosensitive resin composition contains the polyimide precursor having the repeating unit shown by formula I, the photopolymerization initiator, the polymerizable unsatd. compd. and the org. solvent. In formula I, R1 is a group shown by formula II, R2 is a divalent aromatic, aliphatic, alicyclic ring or an organosiloxane group. In formula II, R3, R4 and R5 are each a monovalent hydrocarbon group which may be substd., R2 and R4 may be the same group with each other, (n) is an integer of 1-20. Thus, the solubility and the light permeability of said composition are improved, and the formation of a thick film becomes easily.
申请公布号 JPH01105241(A) 申请公布日期 1989.04.21
申请号 JP19880171424 申请日期 1988.07.08
申请人 HITACHI CHEM CO LTD 发明人 SATO KUNIAKI;ISHIMARU TOSHIAKI;SAITO TAKAYUKI;KIKUCHI NOBURU;HAYASHI NOBUYUKI
分类号 G03F7/037;G03F7/075 主分类号 G03F7/037
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