发明名称 SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
摘要 A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
申请公布号 US2016377994(A1) 申请公布日期 2016.12.29
申请号 US201615261553 申请日期 2016.09.09
申请人 ASML NETHERLANDS B.V. 发明人 LAFARRE Raymond Wilhelmus Louis;DONDERS Sjoerd Nicolaas Lambertus;TEN KATE Nicolaas;DZIOMKINA Nina Vladimirovna;KARADE Yogesh Pramod;RODENBURG Elisabeth Corinne
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. A substrate holder for use in a lithographic apparatus, the substrate holder comprising: a main body having a smooth and flat surface; a thin-film stack provided on the surface and forming an electric component; and a plurality of burls provided on the thin-film stack and having end surfaces to support a substrate.
地址 Veldhoven NL