发明名称 |
SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER |
摘要 |
A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack. |
申请公布号 |
US2016377994(A1) |
申请公布日期 |
2016.12.29 |
申请号 |
US201615261553 |
申请日期 |
2016.09.09 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LAFARRE Raymond Wilhelmus Louis;DONDERS Sjoerd Nicolaas Lambertus;TEN KATE Nicolaas;DZIOMKINA Nina Vladimirovna;KARADE Yogesh Pramod;RODENBURG Elisabeth Corinne |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body having a smooth and flat surface; a thin-film stack provided on the surface and forming an electric component; and a plurality of burls provided on the thin-film stack and having end surfaces to support a substrate. |
地址 |
Veldhoven NL |