| 摘要 |
In a process according to the German patent application P 36 39 346.0 a synchrotron beam of relatively large vertical extension is used. This can lead to inaccuracies in the images if large changes are made in the image scale. To obtain high resolution, even if large changes are made in the image scale, the object (10) is irradiated with an X-ray beam of slit-shaped cross-section, by arranging a cylindrical mirror (4) with its axis perpendicular to the direction of irradiation while focusing the synchrotron beam in the vertical direction. The process can be used to change the image scale in X-ray lithographic apparatus. |
