Method of manufacturing a semiconductor device having rounded trench corners,申请号US19880204550-传众专利搜索

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发明名称	Method of manufacturing a semiconductor device having rounded trench corners
摘要
申请公布号	US4916086(A)	申请公布日期	1990.04.10
申请号	US19880204550	申请日期	1988.06.09
申请人	KABUSHIKI KAISHA TOSHIBA	发明人	TAKAHASHI, KOUICHI;KINOSHITA, HIROSHI;MIYASHITA, NAOTO;SONOBE, HIRONORI
分类号	H01L21/76;H01L21/762;H01L21/763;H01L21/822;H01L27/04	主分类号	H01L21/76
代理机构		代理人
主权项
地址

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