| 发明名称 |
LIGHT-SENSITIVE COMPOSITION FOR THE PREPARATION OF A POSITIVE-ACTING PHOTORESIST |
| 摘要 |
<p>A light-sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a light-sensitive component, said lightsensitive component consisting essentially of a compound of the formula wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue.</p> |
| 申请公布号 |
CA1267559(A) |
申请公布日期 |
1990.04.10 |
| 申请号 |
CA19860502903 |
申请日期 |
1986.02.27 |
| 申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
KELLY, MICHAEL G.;MAMMATO, DONALD;DURHAM, DANA;JAIN, SANGYA;CRANE, LAWRENCE |
| 分类号 |
C09K9/02;G03C1/72;G03F7/022;(IPC1-7):G03C1/56 |
主分类号 |
C09K9/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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