| 摘要 |
Automatic identification of each semiconductor wafer during wafer processing can be achieved by employing an embodiment of the invention, regardless to layers deposited on a code pattern. A code pattern (12; 2a, 2b), preferably a bar code pattern, is formed on or above a front surface (la, 11a) of the semiconductor wafer (1; 11), and a light beam (4, 14) including infrared rays is irradiated onto a bottom surface (lb; 11b) thereof. The infrared rays easily penetrate through the wafer (e.g. of silicon) and reflect from the bar code pattern (12; 2a, 2b) formed on the front surface (la, 11a) of the wafer (1; 11). The reflected beam (5; 15) of infrared rays is received by a detector (6; 16) disposed to the back side of the wafer (1), and the wafer can be identified by decoding the received signal. The bar code pattern (12; 2a, 2b) can be directly formed by scribing the wafer surface by a laser beam or scribing a metal layer deposited thereon. |
