发明名称 ALUMINUM FILM MANUFACTURING METHOD AND MANUFACTURING DEVICE
摘要 Provided are a manufacturing method and a manufacturing apparatus for an aluminum film in which moisture and oxygen do not intrude into a plating chamber. A manufacturing method for an aluminum film, in which aluminum is electrodeposited on a surface of a long, porous resin substrate imparted with electrical conductivity in a molten salt electrolytic solution, includes a step of transferring the substrate W into a plating chamber 1 through a sealing chamber 4 disposed on the entrance side of the plating chamber; a step of electrodepositing an aluminum film on the surface of the substrate W in the plating chamber 1; and a step of transferring the substrate having the aluminum film electrodeposited thereon from the plating chamber 1 through a sealing chamber 5 disposed on the exit side of the plating chamber 1, in which an inert gas is supplied into the plating chamber such that the plating chamber has a positive pressure relative to outside air, and the inert gas is forcibly discharged from an inert gas exhaust pipe 7 provided on each of the two sealing chambers.
申请公布号 EP3103895(A1) 申请公布日期 2016.12.14
申请号 EP20150746409 申请日期 2015.01.26
申请人 Sumitomo Electric Industries, Ltd. 发明人 NISHIMURA, Junichi;HOSOE, Akihisa;OKUNO, Kazuki;KIMURA, Koutarou;GOTO, Kengo;SAKAIDA, Hideaki;MOTOMURA, Junichi
分类号 C25D1/08;C25D1/00;C25D3/66;C25D5/00;C25D5/56;C25D7/06;C25D17/00;C25D21/04 主分类号 C25D1/08
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