发明名称 |
OPTICAL TRANSMISSION/REFLECTION MODE IN-SITU DEPOSITION RATE CONTROL FOR ICE FABRICATION |
摘要 |
Systems and methods of controlling a deposition rate during thin-film fabrication are provided. A system as provided may include a chamber, a material source contained within the chamber, an electrical component to activate the material source, a substrate holder to support the multilayer stack and at least one witness sample. The system may further include a measurement device and a computational unit. The material source provides a layer of material to the multilayer stack and to the witness sample at a deposition rate controlled at least partially by the electrical component and based on a correction value obtained in real-time by the computational unit. In some embodiments, the correction value is based on a measured value provided by the measurement device and a computed value provided by the computational unit according to a model. |
申请公布号 |
EP3102716(A1) |
申请公布日期 |
2016.12.14 |
申请号 |
EP20140891164 |
申请日期 |
2014.05.08 |
申请人 |
Halliburton Energy Services, Inc. |
发明人 |
PRICE, James M.;NAYAK, Aditya B.;PERKINS, David L. |
分类号 |
C23C14/54;C23C14/32 |
主分类号 |
C23C14/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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