| 摘要 |
PURPOSE:To simplify steps of a manufacturing process and improve productivity by forming a supporting film consisting of materials permeable to X-rays on the surface of a substrate and forming an X-ray mask pattern on the supporting film and further, pasting a supporting frame at the rear of the substrate and performing dry back etching by making a hole part in the supporting frame act as a mask pattern. CONSTITUTION:A supporting film 2 which is provided to support each X-ray mask pattern 3 is formed on a substrate 1. After forming each X-ray mask pattern 3, a supporting frame 5 is pasted so that a hole part can be located at a place facing each mask pattern 3. After pasting the supporting frame 5 in this way, dry back etching is performed by using a chlorine trifluoride gas. Consequently, the supporting frame does not produce a distortion at all and, as dry etching is utilized in a back etching process, the pasted supporting frame can be used as a mask pattern. Then a manufacturing process is simplified and productivity is thus improved. |
