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发明名称
WAFER HEATING MECHANISM FOR PLASMA CVD DEVICE
摘要
申请公布号
JPH0435030(A)
申请公布日期
1992.02.05
申请号
JP19900142760
申请日期
1990.05.31
申请人
HITACHI ELECTRON ENG CO LTD
发明人
OYAMA KATSUMI
分类号
H01L21/205;H01L21/31
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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