发明名称 |
Light-emitting diode and method for manufacturing same |
摘要 |
A light-emitting diode includes a support substrate, a semiconductor stack disposed on the support substrate, the semiconductor stack including a p-type compound semiconductor layer, an active layer and a n-type semiconductor layer, a reflective metal layer disposed between the support substrate and the semiconductor stack, the reflective metal layer being in ohmic contact with the p-type compound semiconductor layer of the semiconductor stack and having a groove exposing a portion of the semiconductor stack, a first electrode pad contacting the n-type compound semiconductor layer of the semiconductor stack, an electrode extension connected to the first electrode pad, the electrode extension disposed directly over the groove along a line perpendicular to the support substrate, an upper insulation layer disposed between the first electrode pad and the semiconductor stack. The electrode extension includes an Ni layer contacting the n-type compound semiconductor layer, and two Au layers disposed on the Ni layer. |
申请公布号 |
US9508909(B2) |
申请公布日期 |
2016.11.29 |
申请号 |
US201514980937 |
申请日期 |
2015.12.28 |
申请人 |
Seoul Viosys Co., Ltd. |
发明人 |
Im Tae Hyuk;Kim Chang Yeon;Yoon Yeo Jin;Lee Joon Hee;Nam Ki Bum;Kim Da Hye;Im Chang Ik;Kim Young Wug |
分类号 |
H01L27/15;H01L33/60;H01L33/22;H01L33/20;H01L33/38;H01L33/32;H01L33/44;H01L33/06;H01L33/00 |
主分类号 |
H01L27/15 |
代理机构 |
H.C. Park & Associates, PLC |
代理人 |
H.C. Park & Associates, PLC |
主权项 |
1. A light-emitting diode, comprising:
a support substrate; a semiconductor stack disposed on the support substrate, the semiconductor stack comprising a p-type compound semiconductor layer, an active layer and a n-type semiconductor layer; a reflective metal layer disposed between the support substrate and the semiconductor stack, the reflective metal layer being in ohmic contact with the p-type compound semiconductor layer of the semiconductor stack and comprising a groove exposing a portion of the semiconductor stack; a first electrode pad contacting the n-type compound semiconductor layer of the semiconductor stack; an electrode extension connected to the first electrode pad, the electrode extension overlapping the groove; and an upper insulation layer disposed between the first electrode pad and the semiconductor stack, wherein the electrode extension comprises an Ni layer contacting the n-type compound semiconductor layer, and at least two Au layers disposed on the Ni layer. |
地址 |
Ansan-si KR |