发明名称 Light-emitting diode and method for manufacturing same
摘要 A light-emitting diode includes a support substrate, a semiconductor stack disposed on the support substrate, the semiconductor stack including a p-type compound semiconductor layer, an active layer and a n-type semiconductor layer, a reflective metal layer disposed between the support substrate and the semiconductor stack, the reflective metal layer being in ohmic contact with the p-type compound semiconductor layer of the semiconductor stack and having a groove exposing a portion of the semiconductor stack, a first electrode pad contacting the n-type compound semiconductor layer of the semiconductor stack, an electrode extension connected to the first electrode pad, the electrode extension disposed directly over the groove along a line perpendicular to the support substrate, an upper insulation layer disposed between the first electrode pad and the semiconductor stack. The electrode extension includes an Ni layer contacting the n-type compound semiconductor layer, and two Au layers disposed on the Ni layer.
申请公布号 US9508909(B2) 申请公布日期 2016.11.29
申请号 US201514980937 申请日期 2015.12.28
申请人 Seoul Viosys Co., Ltd. 发明人 Im Tae Hyuk;Kim Chang Yeon;Yoon Yeo Jin;Lee Joon Hee;Nam Ki Bum;Kim Da Hye;Im Chang Ik;Kim Young Wug
分类号 H01L27/15;H01L33/60;H01L33/22;H01L33/20;H01L33/38;H01L33/32;H01L33/44;H01L33/06;H01L33/00 主分类号 H01L27/15
代理机构 H.C. Park & Associates, PLC 代理人 H.C. Park & Associates, PLC
主权项 1. A light-emitting diode, comprising: a support substrate; a semiconductor stack disposed on the support substrate, the semiconductor stack comprising a p-type compound semiconductor layer, an active layer and a n-type semiconductor layer; a reflective metal layer disposed between the support substrate and the semiconductor stack, the reflective metal layer being in ohmic contact with the p-type compound semiconductor layer of the semiconductor stack and comprising a groove exposing a portion of the semiconductor stack; a first electrode pad contacting the n-type compound semiconductor layer of the semiconductor stack; an electrode extension connected to the first electrode pad, the electrode extension overlapping the groove; and an upper insulation layer disposed between the first electrode pad and the semiconductor stack, wherein the electrode extension comprises an Ni layer contacting the n-type compound semiconductor layer, and at least two Au layers disposed on the Ni layer.
地址 Ansan-si KR