发明名称 MANUFACTURE OF RESISTOR ELEMENT
摘要 <p>PURPOSE: To distribute the flow of currents to a resistance element by executing the adjustment of the resistance element to a set value by the removal of one part of a resistance film, and allowing a fine adjustment notch provided at the resistance film to travel from the free edge of a slave notch to a main notch in parallel to the slave notch. CONSTITUTION: A resistance between tip part members 2 and 3 is set to a value below a target value before adjustment. A prescribed area is separated from partial paths 71-75 by fine adjustment notches 81-85 for the purpose of the adjustment of the resistance element to the target value. The fine adjustment notches 81-85 start from the free edge of a slave notch 511 or 611, travels in parallel to the slave notch, and ends with a main notch 61 or 51. Thus, an area between one of the slave notches 511 and 611 and a fine adjustment layer belonging to this is electrically insulated from the residual resistance paths. Thus, the adjustment can be attained by the only fine adjustment notch in the partial paths 71-75.</p>
申请公布号 JPH04225201(A) 申请公布日期 1992.08.14
申请号 JP19910066369 申请日期 1991.03.29
申请人 SIEMENS AG 发明人 ANDOREASU BUIRUTOGEN
分类号 H01C17/242;H01C17/24 主分类号 H01C17/242
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