| 摘要 |
PURPOSE:To enable production of patterns having high resolution and good cross sectional shapes suitable for superfine working by incorporating an alkali soluble resin and specified compds. to the photoresist compsn. CONSTITUTION:This resist compsn. contains an alklai soluble resin and one or more kinds of compds. expressed by formula I. In formula I, m and n are 2 or 3, D1 and D2 are hydrogen atoms, naphthoquinone-1,2-diazide-5-sulfonyl groups, etc., R1 is a hydrogen atom, methyl group, etc., and R2 is a hydrogen atom, halogen atom, etc. The alkali soluble resin is, for example, an alkali- soluble novolac resin. The compounding ratio of the compd. of formula I to the alkali soluble resin is preferably 10-100 pts.wt of the compd. of formula I to 100 pts.wt. of the alkali-soluble resin. |
