MEMS structure having rounded edge stopper and method of fabricating the same

摘要

A method of fabricating MEMS device includes forming a plurality of rounded edge trenches on a sacrificial layer over a carrier substrate. Then, formation of a polycrystalline silicon layer over the sacrificial layer to fill the trenches. A plurality of stoppers is defined by the trenches and protrudes from the polycrystalline silicon layer toward the carrier substrate Subsequently, a portion of the sacrificial layer is removed to define a recess between the polycrystalline silicon layer and a carrier substrate and expose the stoppers.

主权项

1. A method of fabricating a MEMS device, comprising:
forming a plurality of rounded edge trenches on a sacrificial layer over a carrier substrate; forming a polycrystalline silicon layer over the sacrificial layer to fill the trenches, wherein a plurality of stoppers are defined by the trenches and protrude from the polycrystalline silicon layer toward the carrier substrate; etching the polycrystalline silicon layer through to the sacrificial layer to form a plurality of vias; and removing a portion of the sacrificial layer by selective etching through the vias to define a recess between the polycrystalline silicon layer and a carrier substrate and to expose the stoppers.