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发明名称
POSITIVE PHOTORESIST COMPOSITIONS
摘要
申请公布号
KR940001550(B1)
申请公布日期
1994.02.24
申请号
KR19890004297
申请日期
1989.03.31
申请人
HOECHST CELANESE CORP
发明人
RAJARUS, RICHARD M.;LERDON, EDWARD J.;DISIT, SUNIT S.
分类号
G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/038
主分类号
G03F7/022
代理机构
代理人
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