发明名称 POSITIVE TYPE RADIATION SENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To enhance sensitivity, resolution, dimensional fidelity, focus allowance, and the like by incorporating an alkali-soluble novolak resin and a specified quinonediazido compound. CONSTITUTION:This resin composition contains the alkali-soluble novolak resin and the quinonediazido compound having repeating units each represented by formula I in which R<1> is 1-10C alkyl or 1-7C alkoxy or the like; each of R<2> and R<3> is H or 1-10C alkyl or the like; and each of m and n is an integer of 0-3 and 1-3, respectively, and m+n<=4. The quinonediazido compound has a weight average molecular weight Mw of <=4000 in terms of standard polystyrene by GPC, and a ratio of Mw to a number average molecular weight Mn, Mw/Mn (dispersion degree) is <=2.5. The average condensation degree of the quinonediazidosulfonyl group to hydroxyl group corresponds to that of the phenol resin in which the area ratio of a one-ring component and a two-ring component to the total elution components is <15% and the quinonediazidosulfonic acid. The average condensation degree of the quinonediazido sulfonyl group is <=75%.
申请公布号 JPH0667418(A) 申请公布日期 1994.03.11
申请号 JP19920216991 申请日期 1992.08.14
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 HIRAOKA RYOICHI;KAJITA TORU;OTA TOSHIYUKI;TSUJI AKIRA
分类号 G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/022
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