发明名称 ANTIFOGGING, ANTIREFLECTIVE FILM, COVER BASE SUBSTRATE WITH ANTIFOGGING, ANTIREFLECTIVE FILM, AND METHOD OF MANUFACTURING ANTIFOGGING, ANTIREFLECTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide an antifogging, antireflective film that eliminates the need for special excitation with ultraviolet rays and maintains hydrophilic properties stably for a long period in the absence of sunlight, has an average reflectance of 1% or lower within an arbitrary wavelength range of 200 nm of a wavelength range of 400-1500 nm, and can secure a clear visual field even in an environment of fog, rainfall, temperature variation, etc.SOLUTION: The present invention relates to an antifogging, antireflective film characterized in that: a first dielectric film 30 and a second dielectric film 40 having a lower reflectance than the first dielectric film are laminated alternately on at least one surface of a transparent base material 10 by four layers or more; the top layer is a second dielectric film; the first dielectric film is made of an inorganic compound exhibiting photocatalytic reaction; the second dielectric film is made of a hydrophilic compound; the antifogging, antireflective film has a reflectance of 1% or less within a range from a first arbitrary specified wavelength a nm to b nm as a second specified wavelength a+200 nm in a wavelength range of 400 to 1,500 nm; and a laminate surface has an angle of 10 degrees or less of contact with water.SELECTED DRAWING: Figure 1
申请公布号 JP2016224113(A) 申请公布日期 2016.12.28
申请号 JP20150107538 申请日期 2015.05.27
申请人 GEOMATEC CO LTD 发明人 NAKAJIMA KENTARO
分类号 G02B1/115;B32B7/02;B32B9/00;G02B1/18 主分类号 G02B1/115
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