| 摘要 |
PROBLEM TO BE SOLVED: To provide an antireflection material capable of preventing deterioration in total light flux of a light source while having a sufficient antireflection function; an optical semiconductor device in which an optical semiconductor element is sealed by the antireflection material; and a method for efficiently producing the antireflection material having further improved antireflection function.SOLUTION: There are provided an antireflection material formed of a resin layer in which an inorganic filler and a nanofiller are dispersed, where the inorganic filler has unevenness for suppressing reflection formed on the surface of the resin layer, and the resin layer is cured on the condition satisfying the following (A) and (B); and a method for producing the antireflection material. (A) The resin layer is cured on the condition that lowest viscosity when viscosity is temporally measured using a rheometer is 1,000 Pa s or less. (B) A gel time when the resin layer is cured on the (A) condition is 8 minutes or less.SELECTED DRAWING: None |
