发明名称 |
DEFECT INSPECTING METHOD, SORTING METHOD, AND PRODUCING METHOD FOR PHOTOMASK BLANK |
摘要 |
A method of inspecting a defect present at a surface portion of a photomask blank having at least one thin film formed on a substrate by use of the inspecting optical system. The method includes setting the distance between the defect and an objective lens of an inspecting optical system to a defocus distance, applying inspection light to the defect through the objective lens, collecting reflected light from the region irradiated with the inspection light, through the objective lens, as a magnified image, identifying a light intensity variation portion of the magnified image, and determining the rugged shape of the defect on the basis of a variation in light intensity of the light intensity variation portion of the magnified image. |
申请公布号 |
EP3109700(A2) |
申请公布日期 |
2016.12.28 |
申请号 |
EP20160172622 |
申请日期 |
2016.06.02 |
申请人 |
Shin-Etsu Chemical Co., Ltd. |
发明人 |
TERASAWA, Tsuneo;FUKUDA, Hiroshi;KISHITA, Takahiro;IWAI, Daisuke;YOKOHATA, Atsushi |
分类号 |
G03F1/84;G01B11/24;G01N21/95 |
主分类号 |
G03F1/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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