POLYMER FOR RESIST UNDERLAYER FILM MATERIAL, RESIST UNDERLAYER FILM MATERIAL, AND PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a polymer for resist underlayer film material which can form a resist underlayer film having excellent alkaline hydrogen peroxide water resistance, excellent embedding/flattening properties, and excellent dry etching properties.SOLUTION: A polymer for resist underlayer film 3 material comprises a repeating unit represented by formula (1) and a repeating unit represented by formula (3) (Rs independently represent H or a methyl group; Ris a specific epoxy group or oxetane group).SELECTED DRAWING: Figure 1