METAMATERIAL AND METHOD FOR FORMING A METAMATERIAL USING ATOMIC LAYER DEPOSITION
摘要
A metamaterial includes a first continuous layer formed with a first material by atomic layer deposition (ALD), a first non-continuous layer formed with a second material by ALD on first upper surface portions of a first upper surface of the first continuous layer, and a second continuous layer formed with the first material by ALD on second upper surface portions of the first upper surface of the first continuous layer and on a second upper surface of the first non-continuous layer.
申请公布号
EP2971229(A4)
申请公布日期
2016.12.28
申请号
EP20140770096
申请日期
2014.03.08
申请人
Robert Bosch GmbH;Purkl, Fabian;Provine, John;Yama, Gary;Feyh, Ando;O'Brien, Gary
发明人
PURKL, Fabian;PROVINE, John;YAMA, Gary;FEYH, Ando;O'BRIEN, Gary