发明名称 METAMATERIAL AND METHOD FOR FORMING A METAMATERIAL USING ATOMIC LAYER DEPOSITION
摘要 A metamaterial includes a first continuous layer formed with a first material by atomic layer deposition (ALD), a first non-continuous layer formed with a second material by ALD on first upper surface portions of a first upper surface of the first continuous layer, and a second continuous layer formed with the first material by ALD on second upper surface portions of the first upper surface of the first continuous layer and on a second upper surface of the first non-continuous layer.
申请公布号 EP2971229(A4) 申请公布日期 2016.12.28
申请号 EP20140770096 申请日期 2014.03.08
申请人 Robert Bosch GmbH;Purkl, Fabian;Provine, John;Yama, Gary;Feyh, Ando;O'Brien, Gary 发明人 PURKL, Fabian;PROVINE, John;YAMA, Gary;FEYH, Ando;O'BRIEN, Gary
分类号 C23C16/44;C23C16/448 主分类号 C23C16/44
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