| 摘要 |
PROBLEM TO BE SOLVED: To uniformly, closely contact to a substrate to be deposited to suppress the occurrence of blur of a film deposition pattern.SOLUTION: A metal mask including a wide sensor electrode part 6 and a narrow wiring pattern 7 and for forming a plurality of transparent electrodes 4 separated by thin line-like separation lines 5 includes a magnetic metal sheet 1 partitioned by thin metal wires 8 corresponding to the separation lines 5 to provide a plurality of opening patterns 9. The width dof the thin metal wire 8 in a portion corresponding to the sensor electrode part 6 of the opening pattern 9 is wider than the width dof the thin metal wire 8 in a portion corresponding to the wiring pattern 7 of the opening pattern 9.SELECTED DRAWING: Figure 3 |
