| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid state imaging device in which formation of a color filter layer, achieving miniaturization and thinning of a color filter layer along with the progress of miniaturization, is achieved with low defect.SOLUTION: In a solid state imaging device 200 where a planarization layer 13 composed of transparent resin, a color filter layer 14 formed corresponding to a photodiode 12, a smoothing layer 15 and a microlens 16 are formed in this oder, on the photodiode formed in matrix on a substrate 11, a first undercoat layer 17 is formed below a first color filter layer 24, that is formed at first on the planarization layer. The undercoat layer uses a material having the surface free energy larger than that of the planarization layer, and the thickness is 100 nm or less.SELECTED DRAWING: Figure 1 |
