发明名称 Electron beam imaging with dual Wien-filter monochromator
摘要 One embodiment relates to a dual Wien-filter monochromator. A first Wien filter focuses an electron beam in a first plane while leaving the electron beam to be parallel in a second plane. A slit opening allows electrons of the electron beam having an energy within an energy range to pass through while blocking electrons of the electron beam having an energy outside the energy range. A second Wien filter focuses the electron beam to become parallel in the first plane while leaving the electron beam to be parallel in the second plane. Other embodiments, aspects and features are also disclosed.
申请公布号 US9443696(B2) 申请公布日期 2016.09.13
申请号 US201514711607 申请日期 2015.05.13
申请人 KLA-Tencor Corporation 发明人 Jiang Xinrong;Han Liqun
分类号 H01J37/26;H01J37/05;H01J37/06;H01J37/10;H01J37/28 主分类号 H01J37/26
代理机构 Okamoto & Benedicto LLP 代理人 Okamoto & Benedicto LLP
主权项 1. An electron beam imaging apparatus comprising: an emitter-source tip that emits electrons; a gun electron lens that focuses the electrons to form an electron beam that is parallel in that the electron beam has electron trajectories that are parallel; a first Wien filter that focuses the electron beam in a first plane while leaving the electron beam to be parallel in a second plane; a slit opening of a slit aperture, wherein the slit opening has a width in the first plane and a length in the second plane, and wherein the width is narrower than the length; and a second Wien filter that focuses the electron beam to become parallel in the first plane while leaving the electron beam to be parallel in the second plane.
地址 Milpitas CA US