发明名称 SEMICONDUCTOR DEVICE ASSEMBLY WITH UNDERFILL CONTAINMENT CAVITY
摘要 Semiconductor device assemblies with underfill containment cavities are disclosed herein. In one embodiment, a semiconductor device assembly can include a first semiconductor die having a base region formed from a substrate material, a recessed surface along the base region, a peripheral region formed from the substrate material and projecting from the base region, and a sidewall surface along the peripheral region and defining a cavity with the sidewall surface in the peripheral region. The semiconductor device assembly further includes a thermal transfer structure attached to the peripheral region of the first die adjacent the cavity, and an underfill material at least partially filling the cavity and including a fillet between the peripheral region and the stack of second semiconductor dies.
申请公布号 WO2016140865(A1) 申请公布日期 2016.09.09
申请号 WO2016US19601 申请日期 2016.02.25
申请人 MICRON TECHNOLOGY, INC. 发明人 CHANDOLU, Anilkumar;HUANG, Wayne, H.;VADHAVKAR, Sameer, S.
分类号 H01L23/28;H01L21/56 主分类号 H01L23/28
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