发明名称 SOLID-STATE IMAGE CAPTURING ELEMENT, MANUFACTURING METHOD THEREFOR, AND ELECTRONIC DEVICE
摘要 The present disclosure relates to a solid-state image capturing element, a manufacturing method therefor, and an electronic device, which are capable of controlling a thickness of a depletion layer. The solid-state image capturing element includes pixels each in which a photoelectric conversion film configured to perform photoelectric conversion on incident light and a fixed charge film configured to have a predetermined fixed charge are stacked on a semiconductor substrate. The technology of the present disclosure can be applied to, for example, back surface irradiation type solid-state image capturing elements, image capturing devices such as digital still cameras or video cameras, mobile terminal devices having an image capturing function, and electronic devices using a solid-state image capturing element as an image capturing unit.
申请公布号 US2016269668(A1) 申请公布日期 2016.09.15
申请号 US201415035300 申请日期 2014.11.17
申请人 SONY CORPORATION 发明人 OSHIYAMA ITARU;TAKAHASHI HIROTSUGU
分类号 H04N5/3745;H01L31/0224;H01L27/146;H01L31/032;H01L31/0328 主分类号 H04N5/3745
代理机构 代理人
主权项 1. A solid-state image capturing element, comprising: pixels each including a photoelectric conversion film and a fixed charge film stacked on a semiconductor substrate, the photoelectric conversion film being configured to perform photoelectric conversion on incident light, the fixed charge film being configured to have a predetermined fixed charge.
地址 Tokyo JP