发明名称 |
SOLID-STATE IMAGE CAPTURING ELEMENT, MANUFACTURING METHOD THEREFOR, AND ELECTRONIC DEVICE |
摘要 |
The present disclosure relates to a solid-state image capturing element, a manufacturing method therefor, and an electronic device, which are capable of controlling a thickness of a depletion layer. The solid-state image capturing element includes pixels each in which a photoelectric conversion film configured to perform photoelectric conversion on incident light and a fixed charge film configured to have a predetermined fixed charge are stacked on a semiconductor substrate. The technology of the present disclosure can be applied to, for example, back surface irradiation type solid-state image capturing elements, image capturing devices such as digital still cameras or video cameras, mobile terminal devices having an image capturing function, and electronic devices using a solid-state image capturing element as an image capturing unit. |
申请公布号 |
US2016269668(A1) |
申请公布日期 |
2016.09.15 |
申请号 |
US201415035300 |
申请日期 |
2014.11.17 |
申请人 |
SONY CORPORATION |
发明人 |
OSHIYAMA ITARU;TAKAHASHI HIROTSUGU |
分类号 |
H04N5/3745;H01L31/0224;H01L27/146;H01L31/032;H01L31/0328 |
主分类号 |
H04N5/3745 |
代理机构 |
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代理人 |
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主权项 |
1. A solid-state image capturing element, comprising:
pixels each including a photoelectric conversion film and a fixed charge film stacked on a semiconductor substrate, the photoelectric conversion film being configured to perform photoelectric conversion on incident light, the fixed charge film being configured to have a predetermined fixed charge. |
地址 |
Tokyo JP |