SURFACE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a surface processing method and a surface processing device which can improve an efficiency in processing while suppressing occurrence of wastes and noise.SOLUTION: The surface processing device, which is configured to remove a coat formed on or an object adhered to a surface of a matter M while moving along the surface of the matter M, comprises: a laser oscillator 2 that oscillates laser light; a precedent laser irradiator 3 that irradiates laser light Lto an upstream side in a moving direction; and a following laser irradiator 4 that irradiates laser light Lto a downstream side in the moving direction. The precedent laser irradiator 3 includes a plurality of scanner units 31 that allows the laser light Lto scan in at least two directions crossing on the surface of the matter M. The scanner units 31 comprise: a first scanner unit 31a which allows the laser light Lto scan in a direction parallel to the moving direction; and a second scanner unit 31b which allows the laser light Lto scan in a direction perpendicular to the moving direction.SELECTED DRAWING: Figure 1