发明名称 |
FLOAT ZONE SILICON WAFER MANUFACTURING SYSTEM |
摘要 |
The process for manufacturing a silicon wafer includes steps for mounting a float zone silicon work piece for exfoliation, energizing a microwave device for generating an energized beam sufficient for penetrating an outer surface layer of the float zone silicon work piece, exfoliating the outer surface layer of the float zone silicon work piece with the energized beam, and removing the exfoliated outer surface layer from the float zone silicon work piece as the silicon wafer having a thickness less than 100 micrometers. |
申请公布号 |
EP3108044(A1) |
申请公布日期 |
2016.12.28 |
申请号 |
EP20150752134 |
申请日期 |
2015.02.18 |
申请人 |
Rayton Solar Inc. |
发明人 |
YAKUB, Andrew, X.;ROSENZWEIG, James, Benjamin;GOORSKY, Mark, Stanley |
分类号 |
C30B33/04;C30B31/22 |
主分类号 |
C30B33/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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