| 摘要 |
A method for diagnosing a particle removal system of a substrate processing system includes: a step of diffusing synthesis particles on a substrate; a step of filtering the synthesis particles by using a light source having a first predetermined wavelength; a step of measuring luminescence of the synthesis particles in a second predetermined wavelength different from the first predetermined wavelength, and determining a first number of the synthesis particles on the substrate; at least one from among a step of moving the substrate through a chamber, and a step of processing the substrate within the chamber of the substrate processing system; a step of filtering the synthesis particles by using the light having the first predetermined wavelength; a step of measuring the luminescence of the synthesis particles in the second predetermined wavelength different from the first predetermined wavelength; and a step of determining a second number of the synthesis particles on the substrate based on the measurement. |
