| 摘要 |
PROBLEM TO BE SOLVED: To provide systems and methods for depositing a carbon hardmask film having a small carbon-hydrogen content on a substrate.SOLUTION: A method include: a step 204 of arranging a substrate in a processing chamber; a step 208 of supplying a carrier gas to the processing chamber; a step of 216 of supplying a hydrocarbon precursor to the processing chamber; a step 220 of supplying a fluorine precursor from a group consisting of WF, NF, SF, and Fto the processing chamber, where a, b and c are integers greater than 0; a step 222 of one of supplying plasma to the processing chamber or creating plasma in the processing chamber, in which fluorine from the fluorine precursor combines with hydrogen from the hydrocarbon precursor in gas phase reactions; and a step 224 of depositing an amorphous carbon hardmask film on the substrate.SELECTED DRAWING: Figure 2 |
