发明名称 SPHERICAL SILICON OXYCARBIDE PARTICLE MATERIAL AND MANUFACTURING METHOD THEREOF
摘要 Provided are spherical silicon oxycarbide particle material and manufacturing method thereof, wherein the average particle size is in the range of 0.1-100 μm and having a sphericity of 0.95-1.0.;Spherical silicon oxycarbide particle material and manufacturing method thereof are provided as follows. Organotrialkoxysilane is hydrolyzed in a pH 3-6 acetic acid aqueous solution, thereafter an alkaline aqueous solution such as a pH 7-12 ammonia water was added to the obtained hydrolysate. The condensation reaction is performed in an alkaline range to form spherical polysilsesquioxane particles that are spherical silicon oxycarbide precursors that has no melting point or softening point. Sintering was then performed at a sintering temperature of 600-1400° C. under inert atmosphere to obtain spherical silicon oxycarbide particle material.
申请公布号 US2016368776(A1) 申请公布日期 2016.12.22
申请号 US201615185011 申请日期 2016.06.16
申请人 JNC CORPORATION 发明人 KIZAKI Tetsuro;IWATANI Keizo
分类号 C01B31/30;C10M103/02;C09K3/14;C04B35/56;C04B35/65 主分类号 C01B31/30
代理机构 代理人
主权项 1. A manufacturing method of spherical silicon oxycarbide (SiOC) particle material comprising the following processes A to C: process A: forming a hydrolysate by adding an organotrialkoxysilane compound having the molecular structure represented by the following Formula (1) drop-wise to an aqueous medium that is adjusted to be acidic; process B: obtaining spherical silicon oxycarbide precursor particles having no melting point or softening point through a condensation reaction conducted by adding an alkaline solution to a solution containing the obtained hydrolysate under stirring, wherein the solution is adjusted to be alkaline; and process C: performing a sintering process to the obtained spherical silicon oxycarbide precursor particles in an inert atmosphere at 600 to 1400° C., wherein in Formula (1), R1 and R2 each independently represents a group selected from a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted arylalkyl group, and in the C1 to C20 alkyl group, any hydrogen may be substituted with halogen, any —CH2— may be substituted with —O—, —CH═CH—, cycloalkylene or cycloalkenylene, and in the alkylene of the substituted or unsubstituted arylalkyl group, any hydrogen may be substituted with halogen, and any —CH2— may be substituted with —O—, —CH═CH—, cycloalkylene or cycloalkenylene.
地址 Tokyo JP