POLISHING AGENT, STORAGE SOLUTION FOR POLISHING AGENT AND POLISHING METHOD

摘要

A polishing agent for mechanochemically polishing a substrate, which comprises a carbon-based material containing 60-95 atm% of carbon when measured by X-ray photoelectron spectroscopy and an insulating material, and removing at least a part of the carbon-based material, said polishing agent comprising abrasive grains containing silica, an allylamine-based polymer and water, wherein the ratio by mass of the allylamine-based polymer content to the abrasive grain content is 0.002-0.400 and the abrasive grains are positively charged in the polishing agent.