| 摘要 |
PROBLEM TO BE SOLVED: To suppress an influence which is applied to a measurement result by adhesion of a sample to a mask plate.SOLUTION: A space formed by an integrating sphere is defined by an internal face of the integrating sphere. The internal face comprises a diffuse reflector. An opening formed on the integrating sphere exposes the space to outside of the integrating sphere. A hole formed on a mask plate is defined by an inner peripheral face of the mask plate. The inner peripheral face comprises a diffuse reflector. The hole comprises, on a principal plane of the integrating sphere side of the mask plate and on a principal plane of a sample side, a hole end on the integrating sphere side and a hole end on the sample side, respectively. The mask can be switched between a state of being attached to the integrating sphere and a state of being detached from the integrating sphere. When the mask is attached to the integrating sphere, a whole body of the hole end on the integrating sphere side is overlapped to the opening. A spherical space is formed by the hole formed on the mask plate and the space. A spherical internal face is formed by the internal face and inner peripheral face. The spherical space is defined by the spherical internal face.SELECTED DRAWING: Figure 6 |
