| 摘要 |
A circulating cooling/heating device that is configured to cool and heat a circulating fluid supplied to a chamber in plasma-etching equipment includes: a reservoir configured to store the circulating fluid; a pump configured to circulate the circulating fluid between the reservoir and the chamber; a heat exchanger configured to perform heat exchange between the circulating fluid and a cooling water, the heat exchanger being immersed in the circulating fluid stored in the reservoir; and a heater configured to heat the circulating fluid in the reservoir. |
