发明名称 STACKED THIN CHANNELS FOR BOOST AND LEAKAGE IMPROVEMENT
摘要 A hollow-channel memory device comprises a source layer, a first hollow-channel pillar structure formed on the source layer, and a second hollow-channel pillar structure formed on the first hollow-channel pillar structure. The first hollow-channel pillar structure comprises a first thin channel and the second hollow-channel pillar structure comprises a second thin channel that is in contact with the first thin channel. In one exemplary embodiment, the first thin channel comprises a first level of doping; and the second thin channel comprises a second level of doping that is different from the first level of doping. In another exemplary embodiment, the first and second levels of doping are the same.
申请公布号 EP3105793(A1) 申请公布日期 2016.12.21
申请号 EP20150765157 申请日期 2015.03.02
申请人 Intel Corporation 发明人 SIMSEK-EGE, Fatma Arzum;SUN, Jie Jason;LI, Benben;JAYANTI, Srikant;ZHAO, Han;HUANG, Guangyu;LIU, Haitao
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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