发明名称 枚葉式エピタキシャルウェーハ製造装置およびそれを用いたエピタキシャルウェーハの製造方法
摘要 PROBLEM TO BE SOLVED: To provide a sheet type epitaxial wafer-manufacturing device capable of preventing position shift of a susceptor at heating, and to provide an epitaxial wafer-manufacturing method using the same.SOLUTION: A sheet type epitaxial wafer-manufacturing device includes: a susceptor 14 provided with a wafer pocket 12 for placing a wafer at a central part of an upper surface; and a supporting shaft 16 supporting and rotating the susceptor 14. The supporting shaft 16 comprises: a rotatable main support pillar 18; and a plurality of arm parts 20 provided to the main support pillar 18, and supporting a lower surface of the susceptor 14. The susceptor 14 has a plurality of susceptor recessed parts 22 on a lower surface of the susceptor. Each arm part 20 has a quartz head part 24 for vertically supporting the lower surface of the susceptor. At least a part of the quartz head part 24 is made tightly fit the susceptor recessed part 22 without a play space, and made contact with a width-direction inner surface of the susceptor recessed part 22.
申请公布号 JP6047854(B2) 申请公布日期 2016.12.21
申请号 JP20130005313 申请日期 2013.01.16
申请人 信越半導体株式会社 发明人 須田 一成
分类号 H01L21/205;C23C16/458;H01L21/683 主分类号 H01L21/205
代理机构 代理人
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