发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 According to one embodiment, a stacked body of N layers is stacked on a semiconductor substrate, steps are provided in the stacked body such that upper layers are retracted behind lower layers, N lower openings are provided in correspondence with the individual layers of the stacked body and are equal in depth, one to N upper openings are provided on one to N lower openings and are different in depth, N lower-layer contact electrodes are provided in the lower openings, and one to N upper-layer contact electrodes are provided in the upper openings.
申请公布号 US2016268291(A1) 申请公布日期 2016.09.15
申请号 US201514816420 申请日期 2015.08.03
申请人 Kabushiki Kaisha Toshiba 发明人 ISHIMURA Munio
分类号 H01L27/115;H01L21/768 主分类号 H01L27/115
代理机构 代理人
主权项 1. A semiconductor device, comprising: a stacked body of N (N is an integer of 2 or more) layers stacked on a semiconductor substrate; steps provided in the stacked body such that upper layers are retracted behind lower layers; N lower openings that are provided in correspondence with the individual layers of the stacked body and are equal in depth; one to N upper openings that are provided on one to N lower openings and are different in depth; N lower-layer contact electrodes provided in the lower openings; and one to N upper-layer contact electrodes provided in the upper openings.
地址 Minato-ku JP
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