| 摘要 |
This sputtering device has a space-defining member for defining a sputtering space in which to form a film on a substrate. The space-defining member has a recess, and the bottom of the recess is provided with an opening. The sputtering device is provided with a shielding member for shielding the opening from the sputtering space. The opening is formed such that it is possible to attach a pressure gauge capable of measuring the pressure inside the sputtering space, and the shielding member is arranged so as to be at least partially embedded within the recess. |
