发明名称 磁気記録膜形成用スパッタリングターゲットの製造方法
摘要 A carbon powder which can be used for the production of a sputtering target for forming a magnetic recording film, said carbon powder being characterized by having a fluorine content of 50 ppm by weight or more; and a sputtering target for forming a magnetic recording film, said sputtering target being characterized by being produced by a sintering method using the carbon powder. The present invention addresses the problem of enabling the production of a magnetic thin film having a granular structure without requiring the use of an expensive cosputtering device, and also addresses the problem of providing a highly dense sputtering target in which the amount of particles generated during sputtering is reduced.
申请公布号 JP5973056(B2) 申请公布日期 2016.08.23
申请号 JP20150505325 申请日期 2014.02.10
申请人 JX金属株式会社 发明人 荻野 真一;中村 祐一郎
分类号 C23C14/34;B22F3/14 主分类号 C23C14/34
代理机构 代理人
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