发明名称 半導体装置の製造方法
摘要 A method of manufacturing a semiconductor apparatus includes: a charging step of charging the thermosetting resin in excess of an amount necessary for forming the sealing layer to fill the inside of the first cavity with the thermosetting resin and discharging an excess of the thermosetting resin from the first cavity; an integrating step of integrating the substrate on which the semiconductor device is mounted, the substrate on which no semiconductor device is mounted and the sealing layer by molding the thermosetting resin while pressurizing the upper mold and the lower mold; and a dicing step of extracting the integrated substrates from the molding mold and dicing the integrated substrates to obtain an individual semiconductor apparatus.
申请公布号 JP5969883(B2) 申请公布日期 2016.08.17
申请号 JP20120221590 申请日期 2012.10.03
申请人 信越化学工業株式会社 发明人 秋葉 秀樹;塩原 利夫;関口 晋
分类号 H01L21/56 主分类号 H01L21/56
代理机构 代理人
主权项
地址