发明名称 半導体発光素子の製造方法
摘要 PROBLEM TO BE SOLVED: To provide a novel method for manufacturing a GaN-based semiconductor light emitting element having a luminous layer of a multiquantum well structure.SOLUTION: In a method for manufacturing a semiconductor light emitting element, a process of growing a barrier layer including an InGaN sub barrier layer and a GaN sub barrier layer stacked therein from an n-type layer side and an InGaN well layer uses Nand Has carrier gas, and includes the steps of: supplying an organic gallium source material and an organic indium source material using Nas carrier gas to grow the InGaN sub barrier layer; growing the GaN sub barrier layer by switching carrier gas from Nto gas containing 85% or more of Hsimultaneously with the stop of the supply of the organic indium source material; and restarting the supply of the organic indium source material while keeping carrier gas as the gas containing 85% or more of Hand switching carrier gas from the gas containing 85% or more of Hto Nat a timing later than the restart timing of the supply of the organic indium source material to grow the InGaN well layer.
申请公布号 JP6049513(B2) 申请公布日期 2016.12.21
申请号 JP20130062034 申请日期 2013.03.25
申请人 スタンレー電気株式会社 发明人 岩山 章;田中 和史
分类号 H01L33/32;H01L21/205;H01S5/343 主分类号 H01L33/32
代理机构 代理人
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