发明名称 ウエハー基板の製造方法
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a wafer substrate which can facilitate the removal of a support substrate and improve the yield.SOLUTION: A method of manufacturing a wafer substrate comprises: a step of forming a bonding layer 13 which includes a bonding material 13a located between the wafer substrate and a support substrate 11 supporting the wafer substrate, and a gap portion 13b surrounded by at least one of the support substrate 11 and the wafer substrate 12, and the bonding material 13a to form a closed space while being continuous from a peripheral side to a center side of a bonding surface; a step of bonding the wafer substrate and the support substrate 11; and a step of opening the closed space of the gap portion 13b so as to remove the wafer substrate and the support substrate 11 from each other.
申请公布号 JP5970986(B2) 申请公布日期 2016.08.17
申请号 JP20120151736 申请日期 2012.07.05
申请人 富士通株式会社 发明人 北田 秀樹
分类号 H01L21/02 主分类号 H01L21/02
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