发明名称 基板処理装置、基板処理方法及びその基板処理方法を実行させるためのプログラムを記録した記憶媒体
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which accurately detects the holding state of a substrate without being affected by a film type and a surface condition etc. of the substrate.SOLUTION: A substrate processing apparatus processes a substrate and includes: a placement base on which the substrate is placed; a holding part which holds a periphery part of the substrate placed on the placement base; a light source which radiates light to the holding part; a detection part which detects quantity of light from the holding part thereby detecting a holding state of the substrate held by the holding part; and a process liquid supply part which supplies a process liquid to the substrate placed on the placement base.
申请公布号 JP5977844(B2) 申请公布日期 2016.08.24
申请号 JP20150002151 申请日期 2015.01.08
申请人 東京エレクトロン株式会社 发明人 田上 浩司;守田 聡;工藤 裕幸
分类号 H01L21/304;G01B11/26;H01L21/306;H01L21/683 主分类号 H01L21/304
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