摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which accurately detects the holding state of a substrate without being affected by a film type and a surface condition etc. of the substrate.SOLUTION: A substrate processing apparatus processes a substrate and includes: a placement base on which the substrate is placed; a holding part which holds a periphery part of the substrate placed on the placement base; a light source which radiates light to the holding part; a detection part which detects quantity of light from the holding part thereby detecting a holding state of the substrate held by the holding part; and a process liquid supply part which supplies a process liquid to the substrate placed on the placement base. |