| 摘要 |
This pattern transfer method for transferring a pattern of an uneven surface of a stamper to a transfer-receiving surface of a base material includes the steps of applying a first UV-curable resin having a first glass transition temperature to the uneven surface of the stamper, irradiating UV rays through a principal exposure surface of the applied film to cure the first UV-curable resin and form a transfer layer on the uneven surface, affixing together the transfer layer of the stamper and the transfer-receiving surface of the base material, an intermediate layer comprising a second UV-curable resin having a second glass transition temperature lower than the first glass transition temperature being interposed therebetween, and peeling the stamper from the transfer layer that is joined with the intermediate layer adjacent to the transfer-receiving layer. |
