| 摘要 |
The present invention relates to a method and apparatus for uniformly controlling the strip temperature of the rapid cooling section of a continuous annealing line. A plurality of sets of cooling nozzle blocks for controlling the strip temperature is installed at the front and back sides of the strip, and is divided into lengthwise flow control nozzle blocks and widthwise flow control nozzle blocks. Strip center temperature meters and widthwise direction temperature meters are installed at the intake and discharge sides of the rapid cooling section. Temperatures obtained using the strip center temperature meters and the width direction temperature meters are used to respectively control the spraying of mist for the lengthwise flow control nozzle blocks and the widthwise flow control nozzle blocks in order to uniformly control the strip temperature and minimize changes in the flatness of the strip. The widthwise temperature meters at the intake and discharge ends of the rapid cooling section of the continuous annealing line are used to detect the temperature. Feedback/feedforward control technique can be used to uniformly control the widthwise temperature of the strip through flow rate control over mist sprayed in the widthwise direction of the rapid cooling section. Favorable effects of being able to minimize changes in the flatness of the strip can be obtained. |
