发明名称 イオン源
摘要 PROBLEM TO BE SOLVED: To stably operate an ion source over a long period by suppressing evaporation of a carbon compound generated inside a vessel for plasma production.SOLUTION: An ion source IS, generating ion beams containing carbon ions, includes: a plasma generation vessel 1 to which process gas containing at least carbon and dillution gas containing at least helium are supplied; and a thermal electron emission section which is disposed at an end of the plasma generation vessel 1 to be electrically separated from a vessel wall surface, and emits thermal electrons.
申请公布号 JP6048829(B2) 申请公布日期 2016.12.21
申请号 JP20130185956 申请日期 2013.09.09
申请人 日新イオン機器株式会社 发明人 阪本 崇
分类号 H01J27/02;H01J27/08;H01J37/08;H01J37/317 主分类号 H01J27/02
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